ACTISTAR
High Temperature Vertical Furnace

Semco ACTISTAR is the compact batch-type, vertical Single very-high-temperature furnace, offered by ECM Greentech and dedicated to post-implant anneal of SiC & GaN wafers. Key characteristics of this furnace line are: high performance temperature treatment combined with industrial process control, integration modularity, and a user-friendly interface. The applied heating technology alloys very fast heat rate for best uniform sheet resistance and shorter cycle times. The ACTISTAR furnace can also handle multiple gases with a temperature range from 200 to 2050°C. Its modular design allows to meet a large range of clean thermal treatment for R&D and Pilot production facilities.

AS150: up to 150mm wafer size

AS200: up to 200mm wafer size

Substrate dimensions	Up to 200 mm
Substrate material	SiC, GaN
Features	Single process chambers Chamber configurable for 150mm or 200mm wafer size Configurable for 25 or 50 wafers Comptact footprint Excelent process precision and repeatibility High performance and life-time process technology Low power consumption and low carbon print Over 30 years process expertise Process temperature up to 2050°C PID Temperature control Temperature measurement by Pyrometers Maximum heat rate ≥ 100°C/min Gas System with N2, Ar, H2 Front side operation access (through-clean-room wall) Industrial Process PLC and Windows® based Mycore supervision
Options	SECS/GEM compliant with SEMI E30, E37 up to customer requirements
Integration	Cassette to Cassette Automation with Robitic and Wafer Transfer System (LINK TO THE ROBOTICS / AUTOMATION IN SERVICE)

Post-implant anneal of SiC & GaN wafers
Compliant graphene growth process

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