Semco OXISTAR is the compact batch-type, vertical Single very-high-temperature furnace, offered by ECM Greentech, and dedicated for Very-high-temperature oxidation of SiC wafers. Key characteristics of this furnace line are: high performance temperature treatment combined with industrial process control, integration modularity, and a user-friendly interface. The applied heating and technology and chamber design alloys best clean oxyde performance. The ACTISTAR furnace can also handle multiple gases from 850 mbar to atmospheric pressure with a temperature range from 200 to 1500°C. Its flexible design allows to meet a large range of clean & safe thermal treatment for R&D and Pilot production facilities.

OS150: up to 150mm wafer size

OS200: up to 200mm wafer size

Technical Sheet


Substrate material SiC, GaN
Substrate dimensions up to 200 mm
Features Single process chambers
Chamber configurable for 150mm or 200mm wafer size
Configurable for 25 or 50 wafers
Compact footprint
Excellent process precision and repeatability
High performance and life-time process technology
Low power consumption and low carbon print
Over 30 years process expertise
Multi zones process temperature up to 1500°C
External & internal thermocouple Digital Direct Temperature Control (DDTC)
Temperature measurement by thermocouples
Maximum heat rate ≥ 10°C/min
Gas System with N2, Ar, O2, NO, N2O, NO2
Front side operation access (through-clean-room wall)
Industrial Process PLC and Windows® based Mycore supervision
Options SECS/GEM compliant with SEMI E30, E37 up to customer requirements
Wet Oxidation with steamer system
In-situ cleaning
Integration Cassette to Cassette Automation with Robotic and Wafer Transfer System (LINK TO THE ROBOTICS / AUTOMATION IN SERVICE)
Very high temperature oxidation of SiC wafers
Post Oxidation Annealing (POA)
Oxidation in Nitrogen monoxide atmosphere