OXISTAR
High Temperature Vertical Furnace

Semco OXISTAR is the compact batch-type, vertical Single very-high-temperature furnace, offered by ECM Greentech, and dedicated for Very-high-temperature oxidation of SiC wafers. Key characteristics of this furnace line are: high performance temperature treatment combined with industrial process control, integration modularity, and a user-friendly interface. The applied heating and technology and chamber design alloys best clean oxyde performance. The ACTISTAR furnace can also handle multiple gases from 850 mbar to atmospheric pressure with a temperature range from 200 to 1500°C. Its flexible design allows to meet a large range of clean & safe thermal treatment for R&D and Pilot production facilities.

OS150: up to 150mm wafer size

OS200: up to 200mm wafer size

Substrate material	SiC, GaN
Substrate dimensions	up to 200 mm
Features	Single process chambers Chamber configurable for 150mm or 200mm wafer size Configurable for 25 or 50 wafers Compact footprint Excellent process precision and repeatability High performance and life-time process technology Low power consumption and low carbon print Over 30 years process expertise Multi zones process temperature up to 1500°C External & internal thermocouple Digital Direct Temperature Control (DDTC) Temperature measurement by thermocouples Maximum heat rate ≥ 10°C/min Gas System with N2, Ar, O2, NO, N2O, NO2 Front side operation access (through-clean-room wall) Industrial Process PLC and Windows® based Mycore supervision
Options	SECS/GEM compliant with SEMI E30, E37 up to customer requirements Wet Oxidation with steamer system In-situ cleaning
Integration	Cassette to Cassette Automation with Robotic and Wafer Transfer System (LINK TO THE ROBOTICS / AUTOMATION IN SERVICE)

Very high temperature oxidation of SiC wafers
Post Oxidation Annealing (POA)
Oxidation in Nitrogen monoxide atmosphere

TUBESTAR Semiconductor
Batch Type Horizontal Tube Furnace

MEMSLAB
Batch type vertical Furnace

ACTISTAR
High Temperature Vertical Furnace