The Semco MEMSLAB compact batch-type, single or multi-chambers vertical PECVD platform offered by ECM Greentech. The MEMSLAB is designed and built with high precision components, which allows for high quality thin film deposition. The applied Low Frequency Plasma feature permits the furnace to reach excellent process performance through a most advantageous horizontal thin substrate processing. This platform excels in the processing of small quantities of substrates; therefore, allowing the MEMSLAB to meet requirements of universities, research laboratories, or small production facilities.
MEMSLAB-UNO
MEMSLAB-SIA
MEMSLAB-DUO
MEMSLAB-TRIO
MEMSLAB-SIA2
MEMSLAB-QUATRO
Technical Sheet
| Substrate dimensions | Up to 25 wafers per chamber Up to 200 mm (Semiconductor round wafers) Alternative graphite plates for smaller samples |
| Substrate material | Si, SiC, GaN, Sapphire, ceramic, quartz, metal (non conductive subtrates require conductive pre-layer for RF plasma deposition compliance) |
| Features | Modular and flexible & tiny footprint Excelent process precision and repeatibility High performance and life-time process technology Low power consumption and low carbon print Over 30 years process expertise Direct Plasma, Low RF Excellent passivation properties Dense layer, good wet chemical resistance Full & single surface deposition or etching Pin mark free limited warp around Superb deposition uniformity Thin wafer compliant Gas Cabinet for up to 13 gas distribution Multiprocesses Gas Panel with up to 9 MFC gas loops Automatic chamber loading Compatible with solar cell square substrate |
| Options | Process related pump package SECS/GEM compliant with SEMI E30, E37 up to customer requirements Dedicated additional process features upon process configuration |
| Integration | Cassette to Cassette Automation with Robitic and Wafer Transfer System (LINK TO THE ROBOTICS / AUTOMATION IN SERVICE) |
| SiNx |
| SiO2 |
| SiOxNy |
| SiC |
| SiCxNy |
| a-Si (intrinsic or p/n doped) |
| PSG |
| BSG |
| BPSG |
| AlxOy |
| More layers |
| In-Situ Cleaning / surface etching |
