ECM Greentech offers crystal growth furnaces that capable of growing sapphire crystals using the Edge Defined Film Fed Growth (EFG) method. The standard heating method is inductive; however, it can also be equipped with Cyberstar resistive heating elements. Several sizes are available to meet laboratories requirements as well as R&D centers. Trust ecm greentech for crystal growth expertise and don’t hesitate to contact our team for your projects.

Discover all our crystal growth furnaces

Technical Sheet

Effective dimensions 400*60*6 (L*W*T)
600*150*6 (L*W*T)
Features Various Crystal sizes up to 60 kg
Cyberstrar precise pulling head
Equipped with quartz (or sapphire) window view ports
Resistive or inductive heating
Operating security loop system
Water cooled (working temperature in the reactor up to 2600 °C)
Fully computerized heating process
Chamber capabilities for primary and secondary vacuum
Options Weighing device up to 60 kg
Added crucible translation ( manual or automatic)
Precise pressure regulation system
Controlled mass flow of diffrent atmosphere gases
Integration Possibility of robotics integration
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PVT furnace

Silicon Carbide Crystal Growth
PVT Furnace

edge defined film fed growth furnace

Edge-defined Film-fed Growth (EFG)

micro pulling down

Micro Pulling Down (MPD)
Micro Pulling Down Crystal Growth Furnace

laser heated pedestal growth furnace

Laser Heated Pedestal Growth (LHPG)

MF3000-1

MF3000 XENON LAMP furnace
OPTICAL VERTICAL FLOATING ZONE

mirror furnace

MF2400 Hallogen lamp
optical horizontal floating zone furnace

liquid phase epitaxy furnace

Vertical 3 zone Liquid Phase Epitaxy (VLPE)

liquid phase epitaxy furnace

Liquid Phase Epitaxy (LPE)
Application Crystal growth

bridgman furnace

Bridgman
High temperature Bridgman furnace

tetra arc furnace

Tetra Arc
High temperature melting and crystal growth Arc furnace

kyropoulos furnace

Kyropoulos
Kyropoulos crystal growth machine

Czochralski furnace CZ Puller

Czochralski furnace (CZ)
Czochralski single crystal puller