VS-SERIES are compact batch-type, single or dual reactor vertical furnaces offered by ECM Greentech. Key characteristics of this furnace line are : advanced semiconductor wafer processing combined with industrial high-end process control, integration modularity, and a user-friendly interface. Each populated reactor can be independently configured and operated in a large range of atmospheric, sub-atmospheric or low pressure processes. The VS SERIES can also handle multiple gases and liquid precursors with a temperature range from 200 to 1300°C. Its modular design allows to meet a large range of fully automated single or dual reactors.

Discover all our wafer processing furnaces
Effective dimensions Equipment available for 150 – 200 – 300 mm
Materials Si – SiC – GaN – Sapphire – Quartz – Glass – Metal – III V – II VI – Superconductors
Features Equipment capabilities :
Modular, Flexible & compact footprint
1 to 2 independent process chamber
Reactors from 6’’ up to 12’’ wafer size
Configurable from 25/50 to 100/150 wafers per chamber
Process flexibility :
Atmospheric, reduced and low pressure (LYDOP/LYTOX, LPCVD) Wide range of Process gases and multi-process capabilities
Excellent process precision and repeatability
Fully automatic loading & traceability
Machine design :
High performance and lifetime process technology
External, internal, cascade, feedforward and selectable PID
temperature control
All furnace components Hub connected
Industrial Process PLC & Safety PLC
Ergonomic Windows® based SmartCore supervision
CE certified & SEMI S2 compliant
Applications Microelectronics – Optoelectronics – Power Devices – Aeronautics – Sensors – Medical
Integration Possibility of robotics integration and software controled growth process
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