SOLARLAB is the Semco compact batch-type, single or multi-chambers vertical PECVD platform offered by ECM Greentech. The SOLARLAB is designed and built with high precision components, which allows for high quality thin film deposition. The applied Low Frequency Plasma feature permits the furnace to reach excellent process performance through a most advantageous horizontal thin substrate processing. This platform excels in the processing of small quantities of substrates; therefore, allowing the SOLARLAB to meet requirements of universities, research laboratories, or small production facilities.
MEMSLAB-UNO
MEMSLAB-SIA
MEMSLAB-DUO
MEMSLAB-TRIO
MEMSLAB-SIA2
MEMSLAB-QUATRO

Technical Sheet

Substrate dimensions Up to 25 wafers per chamber
Up to 200 mm (Semiconductor round wafers)
Alternative graphite plates for smaller samples
Substrate material Si, SiC, GaN, Sapphire, ceramic, quartz, metal (non conductive subtrates require conductive pre-layer for RF plasma deposition compliance)
Features Modular and flexible & tiny footprint
Excelent process precision and repeatibility
High performance and life-time process technology
Low power consumption and low carbon print
Over 30 years process expertise
Direct Plasma, Low RF
Excellent passivation properties
Dense layer, good wet chemical resistance
Full & single surface deposition or etching
Pin mark free
Limited warp around
Superb deposition uniformity
Thin wafer compliant
Gas Cabinet for up to 13 gas distribution
Multiprocesses Gas Panel with up to 9 MFC gas loops
Automatic chamber loading
Compatible with Semiconductor wafer substrate
Options Process related pump package
SECS/GEM compliant with SEMI E30, E37 up to customer requirements
Dedicated additional process features upon process configuration
Integration Cassette to Cassette Automation with Robitic and Wafer Transfer System (LINK TO THE ROBOTICS / AUTOMATION IN SERVICE)
SiNx
SiO2
SiOxNy
SiC
SiCxNy
a-Si (intrinsic or p/n doped)
PSG
BSG
BPSG
AIxOy
More Layers
In-Situ Cleaning / surface etching